67%-2.33% biaxial strain), thin SiGe-on-insulator (SGOI) structures with Ge atomic fraction ranging from 0.18 to 0.81. SGOI layers (8.7-75 nm thickness) were fabricated by selective oxidization of Si from compressively strained SiGe films epitaxially grown on single crystalline Si-on-insulator (SOI) layers. During high temperature oxidation annealing, strain relaxation occurred due to both intrinsic stacking fault (SF) formation and biaxial stress-driven buckling of the SiGe layers through viscous flow of the overlying and underlying
SiO(2) layers. Transmission electron microscopy (TEM) and x-ray diffraction were performed to confirm the simultaneous occurrence of these two strain relaxation mechanisms. The results indicate that similar to 30% of the observed strain relaxation can be attributed to formation of intrinsic SFs and the remaining GSK2399872A selleck products strain relaxation to stress-driven buckling of the SiGe layers. In addition, cross-sectional TEM images show that some of the SFs and layer buckling roughness appears to be spatially correlated. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3506420]“
recognition based Fe3+ imprinted monolith was prepared for selective removal of Fe3+ ions from aqueous solutions. The precomplexation was achieved by the coordination of Fe3+ ions with N-methacryloyl-(L)-cysteine methyl ester (MAC) to form the complex monomer (MAC-Fe3+). The polymerization step was then carried out in the presence of MAC-Fe3+ complex and hydroxyethyl methacrylate (HEMA) monomer by bulk polymerization NSC 617989 HCl to constitude a Fe3+-imprinted polymer (PHEMAC-Fe3+). The specific surface area of PHEMAC-Fe3+ monolith
was found to be 35.2 m(2)/g, with a swelling ratio of 60.2% after the template was removed from the monolith by 0.1M EDTA solution. The maximum adsorption capacity of PHEMAC-Fe3+ monolith for Fe3+ ion was 0.76 mg/g. The adsorption behavior of the monolith has been successfully described by the Langmuir isotherm. It was determined that the relative selectivity of PHEMAC-Fe3+ monolith was 59.7 and 37.0 times greater than that of the nonimprinted PHEMAC monolith as compared with the Cd2+ and Ni2+ ions, respectively. The PHEMAC-Fe3+ monolith was recovered and reused many times without any significant decrease in its adsorption capacity. (C) 2010 Wiley Periodicals, Inc. J Appl Polym Sci 120: 1829-1836, 2011″
“We report a case series of capsule contraction syndrome in 5 eyes of 4 patients and describe a previously unreported complication full flexion of the haptics onto the anterior surface of the optic Haptics have been reported to slide anterior to the optic while remaining in their original coronal plane.